随着去年由牛津仪器主办，中科院半导体所协办的研讨会成功举行，吸引了110余名来自半导体领域的用户。今年牛津仪器将再次在上海举办为期一天的纳米级等离子研讨会.

      研讨会设在Semicon 2012的前一天, 牛津仪器的国外应用专家及国内知名机构的用户将出席并发言.

      本次研讨会主题与主讲者如下:

??Introduction to ALD and its applications, including photovoltaics; Prof Erwin Kessels, University of Eindhoven (TU/e), Netherlands

??Etch & deposition process in the OPTO and MEMS application device; Dr. Chu Ann-Kuo, Professor of Department of Photonics, National Sun Yat-sen University, Taiwan

??Infrared Focal Plane Arrays (IRFPAs) detector for space applications; Dr. Zhenghua YE, SITP (Shanghai Institute of Technology Physics)

??Micro/Nano fabrication and characterization of Si field electron emitters; Guest Speaker: Dr. Juncong SHE, Sun Yat-Sen University, China

?? ALD used in the MEMS application; Jerry Wang, Manager of Microsystems Technology Center, ITRI, Taiwan

      牛津仪器等离子部的亚洲销售经理Jeffrey Seah先生将为这次研讨会致开幕词：“预计将有许多的观众参加这次的研讨会, 我们非常荣幸地邀请到了国内知名机构的用户介绍他们如何操作使用我们的等离子工艺，同时还有机会与等离子工艺应用专家们分享经验, 从而让大家学习到更多的相关知识。”
   
      我们在2011年取得了成功，今年的研讨会也会有众多知名的嘉宾到场并发表精彩演讲，牛津仪器真诚地期待对等离子工艺的学术和生产有浓厚兴趣的观众参加。